• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    Die Erfindung besteht darin, daß ein für die Gravur von Druckformzylinderoberflächen ausgebildeter Elektronenstrahlerzeuger in den Gravurpausen auf Mikroskopbetrieb umgeschaltet wird, um sofort und ohne zusätzliche Hilfsmittel die gravierten Näpfchen sichtbar zu machen.
    公开号:SU1240347A3
    申请号:SU833663179
    申请日:1983-11-03
    公开日:1986-06-23
    发明作者:Байссвенгер Зигфрид；Боннель Вольфганг
    申请人:Др.-Инж.Рудольф Хелль,Гмбх (Фирма)；
    IPC主号:
    专利说明:

    ten
    15
    Selection refers to engraving devices for printing plates and can be used to control: engraving printing plates.
    The purpose of the invention is to improve the quality control of engraving.
    Figure 1 shows the block diagram of the proposed device; Fig. 2 is a diagram of an electron emission system for an operating mode during an engraving process and in a microscope mode.
    The device contains a printing cylinder 1 with engraved cells 2, obtained using an electron beam 3 (figure 1). Such printing cylinders are used as printing forms for intaglio printing, and when printing cells, which have a different volume depending on the printed current, are filled with printing ink, and in the process of printing, the printing ink is transferred onto the material to be printed.
    In FIG. 2, electron optics and the course of the rays from the electron source, with which the device is operated, are shown. The electron beam 3 leaves the heated cathode 4 connected to the heating circuit, having a power source V). The rays pass through the enelta cylinder 5 and the anode 6 and are fed to the first lens system 7 (Fig. 2). Cylinder 5 Venelta included in 35
    20
    25
    4Q
    thirty
    and
    A circuit with a voltage source V anode 6 is connected to a circuit with a voltage source Vg as a source of anode voltage.
    In addition, the device has an aperture diaphragm 8, and the beam, which passes through the diaphragm, passes through the deflecting system 9 and through the second 10-lens system before it reaches the print cylinder 1. The deflecting system 9 is provided for in order to move line-by-line deflecting beam along checked cells 2. This movement simultaneously with the help of an electron beam 11 and a second deflecting system 12 is reflected on the screen of the cathode-ray tube 13. The corresponding deflection currents are obtained using a raster generator 14, and both deflection systems 9 and 12 are interconnected by a gain circuit 15 for varying the gain. On the side
    five
    five
    0
    five
    A vacuum probe 16 is located from the engraved cells; it captures the secondary flow of electrons emitted from the surface of the printing plate and the reflected electrons and then transfers them to the video amplifier 17, which adjusts the brightness of the cathode-ray tube 13. The sweep is shown on the screen of the cathode-ray, tube 13.
    Figure 2 shows a detailed view of this. The subject of electron beam and the course of the rays for various modes: engraving and microscope (the source of electron radiation, consisting of the cathode, the Venelt cylinder and the anode, as well as the deflection coils are not shown). The first system 7 of lenses 4, with which the first reduction is carried out in practice, consists of two lenses 18 and 19 and another lens 20 is provided for the engraving mode, located inside the lens 18. Three rays are shown with the help of beams 21-23. -, press work: beam 21 - engraving of large cells, beam 22 - engraving. small cells, beam 23 - the mode of operation of the microscope. The probe 16 is a secondary electron flow detector. ronov. The electron-optical conversion unit contains a deviation of the system 9 and the system. 10 lanes
    The isobrah formation unit contains a cylinder. Venelt 5 with an anode 6. and cathode 4, as well as a system of 7 lenses. The indicator cathode ray tube unit has a deflecting system 12 with a cathode ray tube 13. Video amplifier 17 is a Q gain unit. The beam luminance shaping unit consists of a circuit 15 for changing the gain.
    After switching on, the device can operate in several modes.
     Engraving mode.
    The lens system 18-20 forms a reducing step, with a schematically depicted radiation source at maximum voltage.
    0 on the lens gives a 12-fold reduction, and in the absence of a voltage on the lens a 20-3-fold reduction. The aperture diaphragm 8 is selected so that the angle tig is 0.08 rad,
    5 due to which the circle characterizing apertzfnuyu distortion has a diameter of 25 microns. The system 10 lenses gives a 4-fold reduction, and the lens 24 serves
    0
    for focusing and defocusing, which allows the production of cells ,. With a focused beam, image processing is performed, and with a defocused beam, processing is not performed. Beam 21 is used to engrave large cells, with the beam at the surface of the treatment having a diameter of approximately 100 µm and a current in the processing area of 50 mA. Beam 22 is used to make small cells. The beam at the surface of the treatment has a diameter of approximately 20 μm and the current at the treatment site is 3 mA. As a result of varying voltages applied to a dynamic transducer, not more than 20, cells of various sizes can be obtained that determine changes in the luminance of the color.
    In the engraving mode, the deflecting system 9. (4 mg. 1) allows the beam to be synchronized with the rotation of the cylinder 1, with the result that the beam with the cylinder 5 remains at the same place all the time.
    In the engraving mode and in the microscope mode, the acceleration voltage is 50 kV, and the beam going out c. The cathode has a current strength of approximately 50 mA. I. Microscope mode. .
    Dynamic 20 is turned off. Static lens 18 is more intensely excited, and a reduction of the radiation source of approximately 250 V. In this case, a smaller aperture diaphragm 8 is used, depicted by a dash-dot line and installed for this purpose in a rolling beam path. The aperture of this diaphragm makes an angle "| 0.025 glad As a result, the aperture distortion circle has a diameter of approximately 1 micron. The lin system 10 is almost unchanged, and the dynamic focusing lens 24 is turned off.
    As a result of these changes, the path of the beam 23 is ensured, and the system of 10 lenses serves as the depth of focus setting. The diameter of the probe 16 on the surface of the cylinder 1 is 1-1.5 µm.
    The deflection system 9 (Fig. 1) serves to obtain a scanning raster according to the frequency of the rows and frames of the cathode ray tube 1. The sweep field is approximately 1 mm.
    For operation in microscope mode, a detector 16 is provided (Fig. 1), which in the B mode of the microscope swings in the same way as the diaphragm 8. On the screen of the cathode-ray tube 13 there appears an image of the cell in such a way as if the cell is lit from the side, as the detector 16 is directed to the surface of the printing cylinder 1 from the side and electrons, reflecting from the opposite inner side of the cells, most advantageously enter the detector 16.
    The use of the invention improves the quality control of printing plate engraving.
    "/ S V Va%% | 4
    13
    Editor O. Golovach
     ///// 777/777 // Y / // f Figure 2
    Compiled by S.Aleksanov.
    Tehred M. Khodanich Proofreader M. Pojo
    Order 3415/59 Circulation 362Subscription
    , VNIIPI USSR State Committee
    on cases of discoveries and discoveries 113035, Moscow, Zh-35, Raushsk nab., 4/5
    Production and printing company, Uzhgorod, st. Project, 4
    权利要求:
    Claims (1)
    [1]
    DEVICE FOR CONTROL OF ENGRAVING PRINT FORMS, comprising a printing cylinder optically coupled to an electron-optical conversion unit, an electron-optical image forming unit connected by electrical inputs to the outputs of a power source, characterized in that, in order to improve the quality of engraving control, an aperture diaphragm is inserted into it located between the optical lenses of the electron-optical conversion unit and the electron-optical image forming unit, a cathode ray tube, a raster generator, a beam brightness forming unit, an amplification unit and a secondary electron flux detector mounted above a controlled area of the printing cylinder, wherein the output of the secondary electron flux detector is connected to an input of the amplification block, the output of which is connected to the cathode of the indicator block a cathode ray tube, some of the outputs of the disconnecting system of which are connected to the outputs of the raster generator, g its other outputs through the block for forming the beam brightness' are connected to the outputs of the disconnecting the systems of the electron-optical conversion unit, and the optical centers of the electron-optical image forming unit, the electron-optical conversion unit and the aperture diaphragm are located on the same line.
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    同族专利:
    公开号 | 公开日
    DE3381109D1|1990-02-22|
    EP0108375A2|1984-05-16|
    US4549067A|1985-10-22|
    JPH088102Y2|1996-03-06|
    JPH067933U|1994-02-01|
    JPS5998848A|1984-06-07|
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    EP0108375A3|1987-04-01|
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    DE55965C|AKTIENGESELLSCHAFT „FABRIK LEIPZIGER MUSIKWERKE", VORM. PAUL EHRLICH & Co. in Gohlis bei Leipzig|Drive device for mechanical musical works|
    DE1119428B|1958-08-30|1961-12-14|Zeiss Carl Fa|Device for object observation in devices for material processing by means of a charge carrier beam|
    NL268860A|1959-04-17|
    DE1299498B|1964-07-24|1969-07-17|Steigerwald Strahltech|Device for monitoring the beam impact area in corpuscular beam processing devices|
    US3404254A|1965-02-26|1968-10-01|Minnesota Mining & Mfg|Method and apparatus for engraving a generally cross-sectionally circular shaped body by a corpuscular beam|
    JPS532599B2|1972-10-30|1978-01-30|
    GB1410518A|1972-10-30|1975-10-15|Crosfield Electronics Ltd|Preparation of printing surfaces|
    US4041311A|1976-07-12|1977-08-09|Iowa State University Research Foundation, Inc.|Scanning electron microscope with color image display|
    JPS57132657A|1981-02-06|1982-08-17|Akashi Seisakusho Co Ltd|Inclined moving body tube type scanning electron microscope and its similar apparatus|
    JPS6255502B2|1981-02-13|1987-11-19|Dokutoru Ingu Rudorufu Heru Gmbh|AT386297B|1985-09-11|1988-07-25|Ims Ionen Mikrofab Syst|ION RADIATION DEVICE AND METHOD FOR CARRYING OUT CHANGES, IN PARTICULAR. REPAIRS ON SUBSTRATES USING AN ION RADIATOR|
    AT392857B|1987-07-13|1991-06-25|Ims Ionen Mikrofab Syst|DEVICE AND METHOD FOR INSPECTING A MASK|
    DE4031547A1|1990-10-05|1992-04-09|Hell Rudolf Dr Ing Gmbh|METHOD AND DEVICE FOR PRODUCING TEXTURE ROLLERS|
    US5515182A|1992-08-31|1996-05-07|Howtek, Inc.|Rotary scanner|
    DE19840926B4|1998-09-08|2013-07-11|Hell Gravure Systems Gmbh & Co. Kg|Arrangement for material processing by means of laser beams and their use|
    JP4178741B2|2000-11-02|2008-11-12|株式会社日立製作所|Charged particle beam apparatus and sample preparation apparatus|
    DE102006032303B4|2006-07-11|2010-08-19|Ellcie Maintenance Gmbh|Surface treatment device|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    DE19823240653|DE3240653A1|1982-11-04|1982-11-04|METHOD FOR CONTROLLING PRINTING FORM SURFACES BY MEANS OF ELECTRON BEAM|
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